search form

search form
Ion beam accelerator facility (6 MV tandetron with AMS, 2 MV pelletron, 400 kV implanter)
Analytical Service Last update : 2017.09.13 Request for use
RI Category
Analytical Facilities
ion beam,accelerator,ion beam analysis,ion implantation,Accelerator Mass Spectrometry,RBS, PIXE, ERD
Infrastructure for the study of ion beam analysis including Accelerator Mass Spectrometry and ion beam material modification by using three ion beam accelerators(6 MV tandtron, 2 MV pelletron and 400 kV ion implanter)
Application Area
- ion beam material modification by using ion implantation/irradiation
- ion beam analysis: Rutherford Backscattering Spectrometry(RBS),Elastic Recoil Detection(ERD),Proton Induced X-ray Emission(PIXE),Medium Energy Ion Scattering(MEIS),nuclear microprobe
- Accelerator Mass Spectrometry (AMS): Trace element analysis for C-14, Be-10, 36-Cl, Ca-41, I-129 isotopes
․ Bio-research, including the development of new drugs
․ Environmental research, including global warming
․ Archaeological research fields, including dating
․ Geology, Earth Sciences
1. 6 MV tandetron
- Beam lines for AMS, ion beam analysis, nuclear microprobe and implantation
2. 2 MV pelletron
- Beam lines for ion beam analysis, and implantation
3. 400 kV ion implanter
- Beam lines for medium energy ion scattering, and implantation
Biomedical AMS

Accelerator mass spectrometry application

MEIS (Medium Energy Ion Scattering Spectroscopy)

MEIS provides the structural and compositional properties of surface within 10 nm


400 kV Implanter

Implanter can introduce various ions (the desired ion requires prior test.)



Joonkon Kim, John A. Eliades, Byung-Yong Yu, Weon Cheol Lim, Keun Hwa Chae, Jonghan Song Nuclear Instruments and Methods in Physics Research B 391 (2017) 57–63

The Korea Institute of Science and Technology (KIST, Seoul, Republic of (S.) Korea) ion beam facility consists of three electrostatic accelerators: a 400 kV single ended ion implanter, a 2 MV tandem accelerator system and a 6 MV tandem accelerator system. The 400 kV and 6 MV systems were purchased from High Voltage Engineering Europa (HVEE, Netherlands) and commissioned in 2013, while the 2 MV system was purchased from National Electrostatics Corporation (NEC, USA) in 1995. These systems are used to provide traditional ion beam analysis (IBA), isotope ratio analysis (ex. accelerator mass spectrometry, AMS), and ion implantation/irradiation for domestic industrial and academic users. The main facility is the 6 MV HVEE Tandetron system that has an AMS line currently used for 10Be, 14C, 26Al, 36 Cl, 41Ca and 129I analyses, and three lines for IBA that are under construction. Here, these systems are introduced with their specifications and initial performance results.