LARGE FACILITY IN KOREA
Advanced In Situ Nanosurface Analysis System
- Hosting Legal Entity
- Korea Basic Science Institute
- Contact
- RI Category
- Analytical Facilities
- RI Keywords
- In-situ analysis,Nano surface science,Physical property,Ultra High Vacuum (UHV),Low dimensional materials
- TRL
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Basic Technology
Research 1단계 2단계 -
Research to Prove
Feasibility 3단계 4단계 -
Technology
Demonstration 5단계 6단계 -
System/Subsystem
Development 7단계 8단계 -
System Test
Launch &
Operaions 9단계
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Basic Technology
- Description
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3 DAY + 1PREP
"The next generation fusion and composition nanoevaluation system is used for the analysis of synthesized basic materials by combining various Nanosurfaces evaluation equipment after producing samples from in-situ by compiling low-dimensional and organic and inorganic Nano component evaluation and processing equipment at ulrta-high vacuous condition. The purpose of this system is providing the total analytical solution to both academic and industry uses by means of establishing the one-line in situ analytical system which is consisted of high-ends leading 7 analytical instruments and 8 device fabrication systems. - Nano-material properties of metal / oxide / semi-conductor manufactured in the processing device (component, structure, form, and electronic characteristics) are analyzed without being exposed to air - Analysis system made on a real time basis with automatic processing devices based on the recipe - Available to perform the electronic characteristics performance in the low / high temperature as it is possible to manufacture the socket wihtout being exposed to air"
- Application Area
- "- Development and characterization of the new-forthcoming nanomaterials for the future - In-situ chemical composition analysis of catalytic materials"
- Specifications
- "1. NAP-XPS (Near ambient pressure x-ray photoelectron spectroscopy) - UHV (10-9 mbar) preparation chamber (LEED, Ar sputter gun, E-beam heater) - Upper pressure limit = 3 mbar - Temperature range = 25 - 500 ℃ - Quadrupole mass spectrometer for product analysis in gas-phase reaction 2. LEEM/PEEM (Low energy electron microscopy/photoelectron emission microscopy) - Lateral resolution: < 10 nm. (PEEM), < 2 nm (LEEM) - Spot diameter on sample <500 um, sample current ~ 500 nA. - Temperature range : <1500K 3. ARPES (Angle resolved photoelectron spectroscopy) - Energy resolution : < 1.8 meV - Angle resolution : < 0.1 degree - Acceptance angle : ≃ 30 degree 4. Micro XPS/UPS (X-ray/UV photoelectron spectrometer) - Energy resolution : < 0.47 eV - Spatial resolution : < 3μm - Temperature range : < 900K 5. UHV-STM (Ultra high vacuum scanning tunneling microscopy) - Base pressure : 10-11 mbar - Temperature range : 90~400 K - Stability (z noise) < 1 pm rms - Spectroscopy modes : dI/dV, dI/dz, dz/dV"
Equipment Component
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location
169-148, Gwahak-ro, Yuseong-gu, Daejeon, Republic of Korea
